Concave microlens array mold fabrication in photoresist using UV proximity printing

摘要

This paper presents a simple and effective method for fabricating a polydimethyl-siloxane (PDMS) microlens array with a high fill factor. The proposed method utilizes the UV proximity printing and photoresist replication methods. A concave microlens array mold is made using a printing gap in a lithography process. Optical UV light diffraction of UV light is used to deflect light away from the aperture edges to produce a certain exposure in the photo-resist material outside the aperture edges. This method can precisely control the geometric profile of a concave microlens array. The experimental results show that a concave micro-lens array can be formed automatically in photo-resist when the printing gap ranges from 240 to 720 mu m. A high fill factor microlens array can be produced when the control pitch distance between the adjacent apertures of the concave microlens array is decreased to the aperture size.